Mask compatible with different steppers

作者: Yuang-Cheng Wang , Chii-Ming Shiah

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摘要: A mask includes a piece of reticle glass, chromium thin film, pre-alignment mark, first alignment second identification barcode, and barcode. There is also pellicle flame formed on the film to prevent patterning defects caused by particles. The invention compatible with an ASML stepper Nikon

参考文章(1)
Chih-Chiang Liu, Kuo-Cheng Chuan, Mixed mode photomask for nikon stepper ,(1998)