Reduced Size Split Gate Non-volatile Flash Memory Cell And Method Of Making Same

作者: Wang Chunming

DOI:

关键词:

摘要: A reduced size non-volatile memory cell array is achieved by forming first trenches in an insulation layer the row direction, filling with material, second column STI isolation material trenches, and source regions through trenches. Alternately, can be made continuous, diffusion implant has sufficient energy to form continuous line diffusions that each extend across active under regions. This allows control gates of adjacent pairs formed closer together.

参考文章(10)
Chien-Sheng Su, Jeng-Wei Yang, Yueh-hsin Chen, Formation of self-aligned source for split-gate non-volatile memory cell ,(2014)
Wen-Tuo Huang, Po-Wei Liu, Yu-Ling Hsu, Yong-Shiuan Tsair, Ming-Huei Shen, Tsun-Kai Tsao, Architecture to Improve Cell Size for Compact Array of Split Gate Flash Cell with Buried Common Source Structure ,(2013)
Wen-Tuo Huang, Chieh-Fei Chiu, Po-Wei Liu, Yu-Ling Hsu, Yu-Hsiang Yang, Wen-Ting Chu, Yong-Shiuan Tsair, Methods and Apparatus for Non-Volatile Memory Cells with Increased Programming Efficiency ,(2012)
Chang-Jen Hsieh, Chen-Ming Huang, Ya-Chen Kao, Chia-Shiung Tsai, Chi-Hsin Lo, Shih-Chang Liu, Chung-Yi Yu, Wen-Ting Chu, Hung-Cheng Sung, Split-gate memory cells and fabrication methods thereof ,(2007)
Tsuyoshi Arigane, Yoshitaka Sasago, Tetsufumi Kawamura, Takashi Kobayashi, Hitoshi Kume, Non-volatile semiconductor storage device and the manufacturing method thereof ,(2005)
Wen-Tuo Huang, Po-Wei Liu, Wen-Ting Chu, Yong-Shiuan Tsair, Architecture to improve cell size for compact array of split gate flash cell ,(2013)