Statistical evaluation of refractive index, growth rate, hardness and Young's modulus of aluminium oxynitride films

作者: Sabine Dreer , Robert Krismer , Peter Wilhartitz , Gernot Friedbacher

DOI: 10.1016/S0040-6090(99)00564-7

关键词:

摘要: Abstract Aluminium oxynitride films were produced by reactive dc-magnetron sputtering with compositions covering the concentration range from nitride to oxide. The altered deposition parameters power and gas flow rates of argon, nitrogen oxygen. refractive index growth rate determined spectroscopic ellipsometry, which showed negligible absorption. With indentation a nano hardness tester Young's modulus obtained. results these measurements evaluated statistical software. dependences physical properties on film thickness quantified. still had some influence nano-indentation resulting substrate. Furthermore, composition represented oxygen content evaluated. However, evaluations only delivered useful for hardness. It is shown that aluminium can be controlled utilising design experiment evaluation software, delivering correct parameters. For all mentioned graphs are given depicting actual measurement 26 films.

参考文章(15)
Chang Kwon Hwangbo, Linda J. Lingg, John P. Lehan, H. Angus Macleod, F. Suits, Reactive ion assisted deposition of aluminum oxynitride thin films. Applied Optics. ,vol. 28, pp. 2779- 2784 ,(1989) , 10.1364/AO.28.002779
Hulya Demiryont, L. R. Thompson, G. J. Collins, Optical properties of aluminum oxynitrides deposited by laser-assisted CVD Applied Optics. ,vol. 25, pp. 1311- 1318 ,(1986) , 10.1364/AO.25.001311
E.V. Gerova, N.A. Ivanov, K.I. Kirov, Deposition of A1N thin films by magnetron reactive sputtering Thin Solid Films. ,vol. 81, pp. 201- 206 ,(1981) , 10.1016/0040-6090(81)90482-X
T. Hanada, M. Kobayashi, S. Tanabe, N. Soga, Preparation and physical properties of rf-sputtered amorphous films in the Al2O3AlN system Journal of Non-crystalline Solids. ,vol. 135, pp. 227- 235 ,(1991) , 10.1016/0022-3093(91)90424-5
Wang Dehuang, Guo Liang, An aluminum oxynitride film Thin Solid Films. ,vol. 198, pp. 207- 210 ,(1991) , 10.1016/0040-6090(91)90339-Y
Hülya Birey, Sung‐Jae Pak, J. R. Sites, J. F. Wager, Ion‐beam‐sputtered AlOxNy encapsulating films Journal of Vacuum Science and Technology. ,vol. 16, pp. 2086- 2089 ,(1979) , 10.1116/1.570344
G. A. Al‐Jumaily, T. A. Mooney, W. A. Spurgeon, H. M. Dauplaise, Ion assisted deposition of oxynitrides of aluminum and silicon Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 7, pp. 2280- 2285 ,(1989) , 10.1116/1.575928
Bertrand G. Bovard, Ion-assisted processing of optical coatings Thin Solid Films. ,vol. 206, pp. 224- 229 ,(1991) , 10.1016/0040-6090(91)90426-X
B. Jönsson, S. Hogmark, Hardness measurements of thin films Thin Solid Films. ,vol. 114, pp. 257- 269 ,(1984) , 10.1016/0040-6090(84)90123-8