Resistive switching mechanism of ZnO/ZrO2-stacked resistive random access memory device annealed at 300 °C by sol–gel method with forming-free operation
H-S Philip Wong, Heng-Yuan Lee, Shimeng Yu, Yu-Sheng Chen, Yi Wu, Pang-Shiu Chen, Byoungil Lee, Frederick T Chen, Ming-Jinn Tsai, None, Metal–Oxide RRAMProceedings of the IEEE. ,vol. 100, pp. 1951- 1970 ,(2012) , 10.1109/JPROC.2012.2190369