Method of depositing amorphus aluminium oxynitride layer by reactive sputtering of an aluminium target in a nitrogen/oxygen atmosphere
作者： Anthony Paul Wilby
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摘要: This invention relates to a method of depositing an amorphous layer AION. The includes providing aluminium sputter target in the chamber; exposing and chamber O2 saturate exposed surfaces with oxygen; introducing substrate into atmosphere containing at least nitrogen sputtering oxygen deposit AION film.
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