Porous template and imprinting stack for nano-imprint lithography

作者: Niyaz Khusnatdinov , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Frank Y. Xu , Weijun Liu

DOI:

关键词: PorosityNano-NanotechnologyLithographyPore sizeMaterials scienceLithography process

摘要: An imprint lithography template or imprinting stack includes a porous material defining multiplicity of pores with an average pore size at least about 0.4 nm. A porosity the is 10%. The template, stack, both may be used in process to facilitate diffusion gas trapped between and into both, such that polymerizable rapidly forms substantially continuous layer template.

参考文章(112)
Raymond Soria, Jacques Gillot, Sophie Cominotti, Organic-inorganic polycondensate and a method of obtaining the same ,(1993)
G. G. Boiko, G. V. Berezhnoi, Migration Paths of Helium in α-Quartz and Vitreous Silica from Molecular Dynamics Data Glass Physics and Chemistry. ,vol. 29, pp. 42- 48 ,(2003) , 10.1023/A:1022357726057
Tae-Woo Jung, Myung-Ok Kim, Sung-Kwon Lee, Sea-Ug Jang, Method for fabricating transistor of semiconductor device ,(2005)
Fen Wan, Edward Brian Fletcher, Frank Y. Xu, Weijun Liu, Gerard M. Schmid, Nano-imprint lithography template fabrication and treatment ,(2009)
Gareth Hougham, Mary Rothwell, Ronald Nunes, Multilayer architechture for microcontact printing stamps ,(2002)
Zoilo Cheng Ho Tan, Photoresist developer and method ,(2000)
David W. Todd, Lauren R. Wendt, Charles Thomas Markantes, Roger W. Phillips, Myra Tan-Johnson, Barrier film having high colorless transparency and method ,(2003)