作者: M. Meunier , C. Lavoie , S. Boivin , R. Izquierdo , P. Desjardins
DOI: 10.1016/0169-4332(92)90016-Q
关键词: Titanium tetrachloride 、 Excimer laser 、 Molecule 、 Titanium 、 Materials science 、 Photochemistry 、 Adsorption 、 Layer (electronics) 、 Deposition (phase transition) 、 Phase (matter)
摘要: Abstract KrF excimer laser induced deposition of titanium from tetrachloride (TiCl4) occurs through the photodecomposition adsorbed TiCl4 layer. We propose two growth regimes. During an initiation phase, up to 3 nm in thickness, layer is photochemically decomposed giving a rate ∼ 0.015 nm/pulse. In second increases between 2 and 7 nm/pulse due heating preceding deposited film. Between consecutive pulses, molecules primarily diffuse reaction zone leading new ready be transformed solid titanium.