Modeling KrF excimer laser induced deposition of titanium from titanium tetrachloride

作者: M. Meunier , C. Lavoie , S. Boivin , R. Izquierdo , P. Desjardins

DOI: 10.1016/0169-4332(92)90016-Q

关键词: Titanium tetrachlorideExcimer laserMoleculeTitaniumMaterials sciencePhotochemistryAdsorptionLayer (electronics)Deposition (phase transition)Phase (matter)

摘要: Abstract KrF excimer laser induced deposition of titanium from tetrachloride (TiCl4) occurs through the photodecomposition adsorbed TiCl4 layer. We propose two growth regimes. During an initiation phase, up to 3 nm in thickness, layer is photochemically decomposed giving a rate ∼ 0.015 nm/pulse. In second increases between 2 and 7 nm/pulse due heating preceding deposited film. Between consecutive pulses, molecules primarily diffuse reaction zone leading new ready be transformed solid titanium.

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