作者: Jan Bauer , Frank Fleischer , Otwin Breitenstein , Luise Schubert , Peter Werner
DOI: 10.1063/1.2428402
关键词: Epitaxy 、 Nanowire 、 Vapor–liquid–solid method 、 Optoelectronics 、 Molecular beam epitaxy 、 Scanning electron microscope 、 Materials science 、 Electron beam-induced current 、 Electrical resistivity and conductivity 、 Silicon
摘要: Single undoped Si nanowires were electrically characterized. The grown by molecular-beam epitaxy on n+ silicon substrates and contacted platinum/iridium tips. I-V curves measured electron beam induced current investigations performed single nanowires. It was found that the have an apparent resistivity of 0.85Ωcm, which is much smaller than expected for conductance explained hopping conductivity at Si–SiO2 interface nanowire surface.