Effects of Ar-ion implantation and annealing on structural and magnetic properties of Co/Pd multilayers
作者： John Q. Xiao , K. Liu , C. L. Chien , L. F. Schelp , J. E. Schmidt
DOI: 10.1063/1.358371
关键词: Remanence 、 Coercivity 、 Ion implantation 、 Solid-state physics 、 Annealing (metallurgy) 、 Condensed matter physics 、 Magnetization 、 Microstructure 、 Electron beam physical vapor deposition 、 Nuclear magnetic resonance 、 Materials science
摘要: The contrasting effects of ion implantation and thermal annealing on structural magnetic properties Co/Pd multilayers have been studied. Ion causes local damage to the multilayers, resulting in enhanced magnetization due polarization neighboring Pd. Thermal generates massive interdiffusion across interfaces into formation Co‐Pd alloys with a lower magnetization. Effects coercivity remanence also
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