The influence of Au film thickness and annealing conditions on the VLS-assisted growth of ZnO nanostructures.

作者: K Govatsi , A Chrissanthopoulos , V Dracopoulos , S N Yannopoulos

DOI: 10.1088/0957-4484/25/21/215601

关键词: NanoparticleParticle sizeOptoelectronicsCatalysisAnnealing (metallurgy)NanostructureMaterials scienceNanorodVapor–liquid–solid methodNanotechnologyDewetting

摘要: High temperature evaporation methods, such as the vapor–liquid–solid mechanism, have been exploited for controlled growth of ZnO nanostructures on various substrates. While Au is most frequently used catalyst growing nanowires, its morphological features substrate, which determine size and shape grown, not yet methodically explored. In current work, we investigated details thermal dewetting films into nanoparticles Si thicknesses ranging from 2 to 15 nm were annealed under slow fast rates at temperatures formed investigated. The dependence mean particle nominal film thickness in fair agreement with theoretical predictions. method was employed investigate role nanowires. efficient high throughput a given time, realized cases thin films, i.e. when lower than 10 nm. Based these experimental findings, two-step mechanism proposed account nanorods ending ultrathin (∼30 nm), micron-long tips.

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