作者: L. Pahun , Y. Campidelli , F. Arnaud d’Avitaya , P. A. Badoz
DOI: 10.1063/1.107393
关键词: Photodetector 、 Wavelength 、 Silicon 、 Heterojunction 、 Materials science 、 Optoelectronics 、 Quantum efficiency 、 Rectangular potential barrier 、 Cutoff frequency 、 Infrared
摘要: We present the first internal photoemission response of a metal‐Si‐metal heterostructure. Using Pt/Si/ErSi1.7 system, we show that photoresponse this new device can be strongly modified when bias few hundred mV is applied between two metallic electrodes: cutoff wavelength shifted from 1.4 μm to above 5 μm, and quantum efficiency increased up 5% at 1.2 positive front Pt electrode. These dramatic changes are attributed modulation effective potential barrier experienced by photoexcited carriers crossing Si film.