Pulsed laser deposition of electroceramic thin films
作者： M. Mertin , D. Offenberg , C.W. An , D.A. Wesner , E.W. Kreutz
DOI: 10.1016/0169-4332(95)00569-2
关键词: Ellipsometry 、 Thin film 、 Excimer laser 、 Materials science 、 Laser 、 X-ray photoelectron spectroscopy 、 Analytical chemistry 、 Spectroscopy 、 Dielectric 、 Pulsed laser deposition
摘要: Abstract Sintered targets of BaTiO3 are ablated by KrF excimer laser radiation (λL = 248nm) with pulsed-laser deposition (PLD) in order to produce electroceramic thin films for dielectric and ferroelectric applications. Plasma formation expansion is observed a time-of-flight (TOF) setup time-resolved (10 ns resolution) plasma emission spectroscopy (PES) the 200 900 nm wave length range. Thin tetragonal crystalline structure constant up 790 deposited on Si(111)/Ti/Pt substrates. Ellipsometry used determine influence cross-section geometry target surface film thickness homogeneity. The beam parameters particle speed electrical structural properties presented. chemical composition as function processing variables characterized X-ray photoelectron (XPS). Crystalline analysed Raman-microprobe (RMP) diffraction (XRD). Electrical characterisation done impedance measurements.
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