Preferential sputtering of TIC under keV Ar + ion bombardment: Simultaneous sputtering-ISS measurement with He + and Ar + ions

作者: H.J. Kang , Y. Matsuda , R. Shimizu

DOI: 10.1016/0167-2584(83)90693-X

关键词: Secondary ion mass spectrometryIonIrradiationSputteringAtomSingle crystalSpectroscopyInorganic compoundChemistryAnalytical chemistry

摘要: Abstract The composition change of the outermost atom layer TiC(110) under ion bombardment with 1.5–3 keV He+ and + Ar+ ions has been measured by scattering spectroscopy at different sample temperatures. It found that preferential sputtering C atoms takes place for both bombardment, however preferred is more pronounced than ions. elevated temperatures hardly results in any surface below ∼800°C, while enrichment as reported so far.

参考文章(9)
U. Littmark, S. Fedder, Primary recoil contribution to low energy light ion sputtering Nuclear Instruments and Methods in Physics Research. ,vol. 194, pp. 607- 610 ,(1982) , 10.1016/0029-554X(82)90590-0
M. Kaminsky, R. Nielsen, P. Zschack, Preferential sputtering of TiC and TiB2 coatings under D+ and 4He+ bombardment: Partial yields Journal of Vacuum Science and Technology. ,vol. 20, pp. 1304- 1308 ,(1982) , 10.1116/1.571567
R. Shimizu, T. Okutani, T. Ishitani, H. Tamura, Simultaneous measurements of photon and ion emissions from ion bombarded Al in an oxygen atmosphere Surface Science. ,vol. 69, pp. 349- 353 ,(1977) , 10.1016/0039-6028(77)90179-0
S. Fukuda, S. Kato, M. Mohri, T. Yamashina, Changes in surface composition of low-Z compound materials with ion bombardment and heat treatment Journal of Nuclear Materials. pp. 839- 843 ,(1982) , 10.1016/0022-3115(82)90316-6
P. Varga, E. Taglauer, Preferential sputtering of compounds due to light ion bombardment Journal of Nuclear Materials. pp. 726- 731 ,(1982) , 10.1016/0022-3115(82)90296-3
E. Taglauer, W. Heiland, Mass and energy dependence of the equilibrium surface composition of sputtered tantalum oxide Applied Physics Letters. ,vol. 33, pp. 950- 952 ,(1978) , 10.1063/1.90230
G. Betz, Alloy sputtering Surface Science. ,vol. 92, pp. 283- 309 ,(1980) , 10.1016/0039-6028(80)90258-7