Chemical vapour deposition of MoS2 coatings using the precursors MoCl5 and H2S

摘要: MoS 2 lubricant coatings were synthesized by low-pressure chemical vapour deposition (LPCVD) using a gas mixture of MoCl 5 , H S and argon. A thermodynamic analysis shows that the pure can be expected over wide range temperatures. Deposition experiments performed cemented carbide silicon substrates. The influence process parameters on rate, layer composition structure molybdenum sulphide was investigated. Pure layers prepared at substrate temperatures 500 600°C. chlorine content increases remarkably with decreasing temperature due to codeposition ternary x Cl y compounds. At low n 0 (H S)/n (MoCl ) ratio in input gas, Mo 3 is codeposited. Layers deposited 300°C are amorphous. Between 400 600°C, crystalline different morphology texture obtained. TEM investigations show preferred orientation (002) basal planes exists only for first film growth.