Reactive ion etch chamber wafer masking system
作者： Christopher E. Obszarny
DOI:
关键词: Optoelectronics 、 Electromagnetic shielding 、 Wafer backgrinding 、 Analytical chemistry 、 Masking (art) 、 Semiconductor 、 Wafer 、 Reactive-ion etching 、 Materials science
摘要: Disclosed are shielding platters for semiconductor wafers, and more particularly a reactive ion etch (RIE) chamber wafer masking system, wherein mechanical mask facilitates the implementation of multiple etches on single wafer.
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