作者: Udai B Singh , DC Agarwal , SA Khan , S Mohapatra , H Amekura
DOI: 10.3762/BJNANO.5.10
关键词: Nanoparticle 、 Sputtering 、 Transmission electron microscopy 、 Nanotechnology 、 Materials science 、 Ion 、 Analytical chemistry 、 Substrate (electronics) 、 Context (language use) 、 Fluence 、 Rutherford backscattering spectrometry
摘要: The ion-irradiation induced synthesis of embedded Au nanoparticles (NPs) into glass from islands on a substrate is studied in the context recoiling atoms, sputtering and viscous flow. Cross sectional transmission electron microscopy studies revealed formation NPs substrates by 50 keV Si(-) ion irradiation irregularly shaped nanostructures surfaces at fluence 3 × 10(16) ions/cm(2). depth profiles samples were obtained high-resolution Rutherford backscattering spectrometry studies. results TRIDYN simulation reveal role various ion-induced processes during NPs, viz. atoms. Simulation experimental suggest that flow one major factors are responsible for embedding substrate.