Vacuum-deposited gold films: I. Factors affecting the film morphology
作者： Yuval Golan , Lev Margulis , Israel Rubinstein
DOI: 10.1016/0039-6028(92)90188-C
关键词: Transmission electron microscopy 、 Annealing (metallurgy) 、 Mica 、 Composite material 、 Silicon 、 Thin film 、 Sputtering 、 Crystallite 、 Electron diffraction 、 Mineralogy 、 Materials science
摘要: Abstract Thin (300–1000 A) gold films were deposited on glass, mica and silicon substrates (preheated or held at room temperature) by sputtering evaporation. The characterized transmission electron microscopy (TEM), diffraction (ED) voltammetric measurements. Gold produces pebble-type structures with very small grains no crystallographic texture. Evaporation of onto glass large, flat crystallites, a pronounced {111} texture, while smooth (100) it results in non-textured films. Annealing the 250°C always has effect grain enlargement, and, case mica, enhancement
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