Fluid mixing system
作者： Kenro Yoshino , Toshihiro Hanada
DOI:
关键词: Materials science 、 Mixing (process engineering) 、 Measuring instrument 、 Mechanics 、 Volumetric flow rate 、 Semiconductor production 、 Fluid control
摘要: An object of the present invention is to provide a fluid mixing system able mix fluids different lines by any ratio and control flow rates even pulsating fluids, rate fluid, compact in configuration be installed narrow space, enabling easy pipe laying connection at time installation. In invention, feed 1, 2 are provided with valves 4, 10 controlling pressures pressure operations measuring devices 3, 9 actual converting measured values electrical signals, outputting same, units 5, 11 command signals for opening areas or equipment operating based on errors between settings. example, obtain washing solution semiconductor production, hydrofluoric acid hydrochloric mixed pure water 1 part 200 parts.
lens.org 参考文章(13)
John R. Falvo, Edward W. Schnepf, David Montfort, Eliud Robles-Flores, Curved transfer assist blade ,(2006)
Brent D. Elliot, Benjamin R. Strong, Frank R. Balma, Integrated gas panel ,(1995)
Hao Duan, Eric J. Redemann, Christipher Andrew Wacinski, Aaron S. Tint, Nelson Urdaneta, Ultrasonic liquid flow controller ,(2005)
Robert T. Chinnock, Charles Meacham, Clifford Miller, Chemically inert flow control with non-contaminating body ,(2006)
Alexsey Goldshdeyn, Ake Arvid Hellstrom, Control of dilution lines in a dilution headbox of a paper making machine ,(1994)
Nicholas E. Kottenstette, Jesse Ambrosina, Ali Shajii, Mass flow ratio system and method ,(2002)
Louis A. Ollivier, Flow control of process gas in semiconductor manufacturing ,(2001)
Michael J. Selser, James M. Harris, Fluid delivery system and mounting panel therefor ,(2004)
Kenro Yoshino, Shinobu Kamimura, Fluid control system ,(2006)
Michael E. Wilmer, Dynamic gas flow controller ,(1997)