作者: F. Rahimi , A. Iraji zad , F. Razi
DOI: 10.1080/15533170701392636
关键词: Plating 、 Silicon 、 Chemistry 、 Hydrogen 、 Hydrogen sensor 、 Microporous material 、 Layer (electronics) 、 Analytical chemistry 、 Palladium 、 Chemical engineering 、 Porous silicon
摘要: Porous silicon samples are obtained by electrochemical method on n‐type wafers in room light. Scanning electron microscopy showed that the porous structure consisted of macropores under a thin microporous layer. Placing Pd‐electroless solution causes crakes inside layer and growth palladium particles these crakes. However, removing KOH with an ultrasonically assisted process makes rather uniform surface electroless plating. Variation electrical resistance presence diluted hydrogen at temperature revealed best have ability to sense levels down several hundreds ppm. This value is far below flammability limit gas.