作者: Mahito Yamamoto , Keiji Ueno , Kazuhito Tsukagoshi
DOI: 10.1063/1.5030525
关键词: Electron mobility 、 Photocurrent 、 Threshold voltage 、 Optoelectronics 、 Oxide 、 Transistor 、 Materials science 、 Penning trap 、 Responsivity 、 Semiconductor
摘要: The photogating effect is a photocurrent generation mechanism that leads to marked responsivity in two-dimensional (2D) semiconductor-based devices. A key step promote the 2D semiconductor integrate it with high density of charge traps. Here, we show self-limiting surface oxides on atomically thin WSe2 can serve as effective electron traps facilitate p-type photogating. By examining gate-bias-induced threshold voltage shift transistor based single-layer oxide, trap and rate oxide are determined be >1012 cm−2 and >1010 cm−2 s−1, respectively. White-light illumination an oxide-covered 4-layer photocurrent, magnitude which increases hole mobility. During illumination, evolves timescale seconds, portion current persists even after illumination. These observations indicate photogenerat...