作者: P. Cicman , A. Kaneda , N. Hayashi , H. Fujita
DOI: 10.1016/B978-044450398-5/50080-4
关键词: Plasma etching 、 Plasma 、 Charged particle 、 Electron 、 Dusty plasma 、 Ion 、 Magnetic field 、 Atomic physics 、 Chemistry 、 Waves in plasmas
摘要: Publisher Summary Potential formation is one of the most important phenomena to understand plasma physics and also processing plasma. The importance studying negative ion containing plasmas appears in research because are used widely industry. Diffuse confined by magnetic field often as such for etching deposition. This chapter investigates RF potential magnetically electropositive electronegative diffused at pressure 1mtorr. presents observations oscillation amplitude change big jump radial direction, using uniform configuration. illustrates axial profiles argon argon-SF6 both, divergent configuration, indicating that increase due reduction electrons consumed dissociative attachment SF6 molecules. Radial with a observed plasmas, providing higher density central part low outer increases adding gas. Decreasing strength disappears radially can be detected. Understanding shift time averaged calls further investigation.