作者: Udai B Singh , Dinesh C Agarwal , Saif A Khan , Satyabrata Mohapatra , Ambuj Tripathi
DOI: 10.1088/0022-3727/45/44/445304
关键词: Crystallography 、 Surface plasmon resonance 、 Materials science 、 Analytical chemistry 、 Nanoparticle 、 Irradiation 、 Transmission electron microscopy 、 Sputtering 、 Thin film 、 Fluence 、 Ion 、 Acoustics and Ultrasonics 、 Electronic, Optical and Magnetic Materials 、 Surfaces, Coatings and Films 、 Condensed matter physics
摘要: Irradiation of Ag thin films with 100 MeV ions leads to the formation nanoparticles on surface as well catcher, due electronic energy loss mediated sputtering Ag. The experimentally determined sputter yield is found be three orders magnitude higher than values expected for bulk Ag, which explained basis inelastic thermal spike model. confinement in having size smaller electron mean free path (λ) and coverage area results a yield. Transmission microscopy was performed study distribution catcher. variation sputtered particle number constituent atoms follows an inverse power law value exponent (δ) ~ 0.33, at fluence 1 × 1013 cm−2. With increase up 1014 cm−2, additional δ ≈ arises. decreased increased ion-induced sputtering. irradiated sample have partially embedded showing localized plasmon resonance.