Nanophotonics for ultrathin crystalline silicon photovoltaics: When photons (actually) meet electrons

摘要: Nanopatterning has recently demonstrated to be an efficient method for boosting the light absorption of thin films (< 50 μm) crystalline silicon. However, convincing solar cell results are still missing. The goal European project PhotoNVoltaics is investigate impacts that nanopatterns have on silicon cells and identify conditions their integration. present contribution presents main findings consortium so far. Optical modeling optimization nanopatterned thin-film c-Si indicated a few trends regarding design optimum pattern 1-40 μm foils: merged inverted nanopyramids, with progressive profile seem provide best combination antireflective trapping properties, together negligible surface damage coating template subsequent process steps. But despite high Jsc enhancement these expected bring, higher efficiency nanophotonic structures 1-2 μm-thin foils, absolute values indicate thicker foils will preferred if direct competition wafer-based technologies concerned. An ideal structure taking shape as IBC heterojunction cell, frontside nanopattern thickness 40 μm.