Preparation of ZnO:Al thin film on transparent TPT substrate at room temperature by RF magnetron sputtering technique
作者： Xiao-jing Wang , Qing-song Lei , Wei Xu , Wei-li Zhou , Jun Yu
DOI: 10.1016/J.MATLET.2008.12.027
关键词: Materials science 、 Electrical resistivity and conductivity 、 Sputter deposition 、 Thin film 、 Doping 、 Optoelectronics 、 Scanning electron microscope 、 Hall effect 、 Analytical chemistry 、 Transparent conducting film 、 Aluminium 、 Mechanical engineering 、 General Materials Science 、 Mechanics of Materials 、 Condensed matter physics
摘要: Abstract Aluminum doped ZnO thin films (ZnO:Al) deposited on flexible substrates are suitable to be used as transparent conductive oxide (TCO) in solar cells because of the excellent optical and electrical properties. TPT a kind composite materials usually encapsulation material panels. In this paper, ZnO:Al film was firstly substrate by RF magnetron sputtering. The structural, optical, properties were investigated X-ray diffractometry (XRD), scanning electron microscope (SEM), UV–visible spectrophotometer, well Hall Effect Measurement System. Results revealed that obtained had hexagonal structure highly preferred orientation with c -axis perpendicular substrate. Also, showed high transmittance over 80% visible region resistivity about 3.03 × 10 − 1 Ω·cm.
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