Design-dependent gauge factors of highly doped n-type 4H-SiC piezoresistors

作者: T Akiyama , D Briand , N F de Rooij

DOI: 10.1088/0960-1317/22/8/085034

关键词: CantileverGauge factorMaterials scienceComposite materialGauge (firearms)Transverse orientationSingle elementEpitaxyElectronic engineeringWheatstone bridgeDoping

摘要: This paper presents the experimentally obtained gauge factor (GF) of 4H-SiC piezoresistors, fabricated out n-type epitaxial layer and characterized on millimeter-size SiC cantilever beams at room temperature. It was found that GF is dependent piezoresistor's length width. Piezoresistors narrower than approximately 30 µm showed a width-dependent GF. The highest 20.8 with single element piezoresistor in transverse orientation. In longitudinal orientation, −10, which clustered plural identical elements. Essential factors to consider for design optimum piezoresistors Wheatstone bridge configuration are presented.

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