A Neutron Hardness Assurance Screen Based on High-Frequency Probe Measurements

作者: R. A. Bailey , M. A. Ussery , P. J. Vail

DOI: 10.1109/TNS.1976.4328617

关键词: Scattering parametersLinear circuitIntegrated circuitNode (circuits)PhysicsElectronic engineeringWaferAlternating currentTransistorRadiation hardeningNuclear and High Energy PhysicsElectrical and Electronic EngineeringNuclear Energy and Engineering

摘要: The objective of this study was to devise wafer level AC measurement procedures as an aid the development production line radiation hardness assurance screens and controls for complex Integrated Circuits (ICs). This met using a commercially available probe associated test equipment in conjunction with removable pads connected critical circuit node points. procedure demonstrated case 100% electrical neutron effects on transistors dielectrically isolated linear circuits. Prediction accuracies (using damage factor obtained independently) averaged 4% standard deviation. only part more general program which is still progress. A number other applications are described.

参考文章(3)
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M. Brooksby, R. Pering, L. Kraska, High-frequency parameter measurement of monolithic semiconductor devices in wafer form international electron devices meeting. pp. 70- 72 ,(1970) , 10.1109/IEDM.1970.188263
H. J. Tausch, R. J. Antinone, R. A. Bailey, A Simple Transistor Neutron Hardness Screen Using Scattering Parameters IEEE Transactions on Nuclear Science. ,vol. 20, pp. 361- 369 ,(1973) , 10.1109/TNS.1973.4327420