Method and system for fast on-line electro-optical detection of wafer defects

作者: Gad Neumann

DOI:

关键词: PixelImage processingDie (integrated circuit)DetectorWaferMicroscopyOpticsCardinal pointMaterials scienceField of view

摘要: A method and system for fast on-line electro-optical detection of wafer defects featuring illuminating with a short light pulse from repetitively pulsed laser, field view an camera having microscopy optics, imaging moving wafer, on to focal plane assembly optically forming surface photo-detectors at the optical system, formed six detector ensembles, each ensemble including array four two-dimensional CCD matrix photo-detectors, whereby photo-detector produces electronic image large two million pixels, such that simultaneously created images different detectors are processed in parallel using conventional processing techniques, comparing imaged another serving as reference, order find differences corresponding indicative presence die defect.

参考文章(10)
Hideo Tsuchiya, Takayuki Abe, Tomohiro Iijima, Tetsuyuki Arai, Pattern inspection apparatus and pattern inspection method ,(2008)
John D. Cox, David E. Fowler, Multisensor high-resolution camera ,(1991)
Chung-Po Huang, Kuo-Ching Liu, Chu-Kwo Liang, Jong-Kae Fwu, Method and system for measuring object features ,(1997)
Satoru Fushimi, Yoshimasa Oshima, Nobuhiko Aoki, Yasuhiko Hara, Nobuyuki Akiyama, Pattern detection system ,(1982)
Silviu Reinhorn, Avner Karpol, Emanuel Elysaf, Boaz Kenan, Shimon Yalov, Method and apparatus for article inspection including speckle reduction ,(2002)
Kazuo Moriya, Takayuki Tsuzura, Apparatus for inspecting the surface of materials ,(1992)
Shuzo Hattori, Akihiro Kk Toyoda Jidoshokki Seisakusho Yoshida, Hiroshi Kk Toyoda Jidoshokki Seisakusho Miyake, Takahide Kk Toyoda Jidoshokki Seisakusho Iida, Method and device for detecting defects of patterns in microelectronic devices ,(1987)
Robert D. Frankel, John F. Hoose, Lithographic system mask inspection device ,(1986)