In situ electron holographic analysis of biased Si n+ -p junctions

作者: Myung-Geun Han , David J. Smith , Martha R. McCartney

DOI: 10.1063/1.2908045

关键词: Molecular physicsElectrostaticsElectronSiliconBiasingMaterials scienceAnalytical chemistryElectron holographyElectrodeHolographyLiquid junction potential

摘要: The two-dimensional electrostatic potential distribution across Si n+-p junctions over a range of positive and negative biasing conditions has been studied in situ using off-axis electron holography. A sample holder with movable probe as the electrode was used to bias focused-ion-beam-milled membranes during hologram acquisition. Reverse junction resulted an increase junction, whereas decreased forward eventually completely disappeared. trends experimental results matched reasonably well computer simulations.

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