Flux and energy analysis of species in hollow cathode magnetron ionized physical vapor deposition of copper
作者： L. Wu , E. Ko , A. Dulkin , K. J. Park , S. Fields
DOI: 10.1063/1.3504371
关键词: Analytical chemistry 、 Ion 、 Ion plating 、 Materials science 、 Deposition (phase transition) 、 Physical vapor deposition 、 Quartz crystal microbalance 、 Thin film 、 Ion beam deposition 、 Sputter deposition
摘要: … deposited by neutral-dominant sputter deposition, also referred to as physical vapor deposition (PVD), and for roughly the last decade by ionized physical vapor deposition (iPVD). The …
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sci-hub.se 参考文章(27)
Jeffrey A. Hopwood, Ionized physical vapor deposition Academic Press. ,(2000)
Richard H. Huddlestone, Stanley L. Leonard, Harold P. Furth, Plasma diagnostic techniques ,(1965)
SM Rossnagel, J Hopwood, Metal ion deposition from ionized mangetron sputtering discharge Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 12, pp. 449- 453 ,(1994) , 10.1116/1.587142
B. E. Cherrington, The use of electrostatic probes for plasma diagnostics—A review Plasma Chemistry and Plasma Processing. ,vol. 2, pp. 113- 140 ,(1982) , 10.1007/BF00633129
J. D. Swift, M. J. R. Schwar, John H. Keller, Electrical probes for plasma diagnostics ,(1969)
Wim. J. Weber, Richard J. Armstrong, Jan Trulsen, Ion‐beam diagnostics by means of an electron‐saturated plane Langmuir probe Journal of Applied Physics. ,vol. 50, pp. 4545- 4549 ,(1979) , 10.1063/1.326554
S. M. Rossnagel, Magnetron plasma diagnostics and processing implications Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 6, pp. 1821- 1826 ,(1988) , 10.1116/1.575262
J. Liu, G. L. Huppert, H. H. Sawin, Ion bombardment in rf plasmas Journal of Applied Physics. ,vol. 68, pp. 3916- 3934 ,(1990) , 10.1063/1.346278
Joseph R. Woodworth, Merle E. Riley, Dorothy C. Meister, Ben P. Aragon, Minh S. Le, Herbert H. Sawin, Ion energy and angular distributions in inductively coupled radio frequency discharges in argon Journal of Applied Physics. ,vol. 80, pp. 1304- 1311 ,(1996) , 10.1063/1.362977
S. M. Rossnagel, J. Hopwood, Magnetron sputter deposition with high levels of metal ionization Applied Physics Letters. ,vol. 63, pp. 3285- 3287 ,(1993) , 10.1063/1.110176