Precise thin-film etching process using a rectangle cathode tool
作者： P.S. Pa
DOI: 10.1016/J.MSSP.2010.10.007
关键词: Liquid-crystal display 、 Cathode 、 Nanotechnology 、 Materials science 、 Nanostructure 、 Color gel 、 Volumetric flow rate 、 Thin-film transistor 、 Thin film 、 Etching (microfabrication) 、 Optoelectronics
摘要: The low yield of indium-tin-oxide (ITO) usually persists throughout the processes semiconductor production. By establishing a recycle process for ultra-precise etching ITO thin-film, industry can effectively defective products, thereby reducing both production costs and pollution. This study presents new nanotechnology application using rectangle cathode tool that offers fast rate from color filter surface TFT-LCD. In current experiment, design features thin-film nanostructure are major interest. Low thickness cathode, adequate gap-width between workpiece, large flow electrolyte, or high working temperature corresponds to thin-film. An effective low-cost electrochemical need little time enable easy clean etching.
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