Investigation of TiN deposition in different sized PACVD reactors by means of optical emission spectroscopy
作者： M. Eckel , P. Hardt , M. Schmidt
DOI: 10.1016/S0257-8972(99)00091-2
关键词: Analytical chemistry 、 Current density 、 Tin 、 Cathode 、 Materials science 、 Deposition (law) 、 Scanning electron microscope 、 Layer (electronics) 、 Emission spectrum 、 Plasma
摘要: Abstract The TiN-PACVD process by pulsed d.c. plasma in a TiCl 4 /N 2 /H /Ar gas mixture is investigated. emission spectra are measured dependence on the discharge conditions like reactor size (30 l, 200 500 l), current density (0.072–0.98 mA/cm ) and N inlet ratio (0.03–1.07). It possible to carry out spatially resolved measurements small cathode region. Ti + , H, Ar lines observed. A line only observed glow, of other species also detected negative glow. spatial intensity distribution various different. Scanning electron microscopy glow optical spectroscopy were carried investigate layer properties. growth rate film morphology mainly depend density. composition (Ti/N∼1) changes essential admixtures.
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