Etching process optimization using NH4Cl aqueous solution to texture ZnO:Al films for efficient light trapping in flexible thin film solar cells
作者： S. Fernández , O. de Abril , F.B. Naranjo , J.J. Gandía
DOI: 10.1016/J.TSF.2011.04.207
关键词: Polyethylene terephthalate 、 Light scattering 、 Surface roughness 、 Optoelectronics 、 Etching (microfabrication) 、 Isotropic etching 、 Transmittance 、 Aqueous solution 、 Optics 、 Texture (crystalline) 、 Materials science
摘要: Abstract 0.5 μm-thick aluminum-doped zinc oxide (ZnO:Al) films were deposited at 100 °C on polyethylene terephthalate substrates by Radio Frequency magnetron sputtering. The as-deposited compact and dense, showing grain sizes of 32.0 ± 6.4 nm resistivities (8.5 ± 0.7) × 10 − 4 Ω cm. average transmittance in the visible wavelength range structure ZnO:Al/PET was around 77%. capability a novel two-step chemical etching using diluted NH 4 Cl aqueous solution to achieve efficient textured surfaces for light trapping analyzed. results indicated that both method resulted appropriated obtain etched with surface roughness 32 ± 5 nm, haze factors 500 nm 9% scattering angles up 50°. To validate all these results, commercially ITO coated PET substrate used comparison.
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