作者: Dinara Dallaeva , Ştefan Ţălu , Sebastian Stach , Pavel Škarvada , Pavel Tománek
DOI: 10.1016/J.APSUSC.2014.05.086
关键词: Nanotechnology 、 Epitaxy 、 Sapphire 、 Optoelectronics 、 Thin film 、 Materials science 、 Fractal analysis 、 Substrate (electronics) 、 Surface roughness 、 Sputter deposition 、 Nitride
摘要: … 3D microtopographic AFM images of Al 2 O 3 substrate before and after dry plasma etching are shown in Fig. 2 and AFM images of AlN epilayers on the sapphire substrate deposited at …