Processing apparatus and method
作者： Yusuke Fukuchi
DOI:
关键词: Plasma 、 Substrate (printing) 、 Oxygen atom 、 Processing methods 、 Nitrogen 、 Oxidizing agent 、 Nitriding 、 Materials science 、 Chemical engineering 、 Metallurgy
摘要: A processing method for forming an insulated film on a surface of substrate to be processed, through oxynitriding treatment includes the steps nitriding by irradiating plasma containing nitrogen atoms onto substrate, and oxidizing which has been nitrided, oxygen atoms.
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