Slotted cantilever diffusion tube system with a temperature insulating baffle system and a distributed gas injector system

摘要: There is a slotted cantilever diffusion tube system with temperature insulating baffle and distributed gas injector system. Uniquely, there an enhanced that decreases the defects of wafers due to temperature, pressure, concentration fluctuations in low pressure chemical vapor deposition (LPCVD) process for fabricating IC wafers. Specifically, cantilevered quartz (12, 14) has at least one barrier (28) placed between lower end (27) under (18). Additionally, are two injection exhaust ports (30, 32, 34) along length near assure relatively uniform heating chamber (17). Moreover, sensor (20) having its gauges on outside extending into through section wafer chamber. (12) couplings (40), located flange ring's ( 22) oven's (14) abutting surfaces (36, 38), designed allow sealable flexible attachment surfaces.