Investigation of the properties of amorphous carbon films obtained in a supersonic gas jet
作者： F.N. Dultsev , E.A. Kolosovsky , Yu.V. Nastaushev , G.A. Pozdnyakov
DOI: 10.1016/J.SURFCOAT.2014.02.066
关键词: Carbon 、 Plasma 、 Materials science 、 Carbon film 、 Silicon 、 Etching (microfabrication) 、 Methane 、 Amorphous carbon 、 Analytical chemistry 、 Jet (fluid)
摘要: Abstract Amorphous carbon films on silicon, obtained in the supersonic gas jet containing dimers (C 2 ), are investigated. The plasma is generated by disk magnetohydrodynamic accelerator which methane used as plasma-forming gas. resulting layers consist of two phases; their relation depends distance from nozzle to substrate. It was shown that hydrogenated phase easily removed during etching oxygen plasma. Scanning electron microscopic and ellipsometric measurements were carried out. data adsorption activity with respect alcohols, aromatic hydrocarbons heptane obtained.
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