Methods for nanoscale feature imprint molding
作者： Gabriel Gebara , Barry Sassman , Muhammad Mustafa Hussain , Ed Labelle , Sidi Lanee
DOI:
关键词: Silicon 、 Substrate (electronics) 、 Deposition (law) 、 Layer (electronics) 、 Feature (archaeology) 、 Materials science 、 Nanoscopic scale 、 Optoelectronics 、 Molding (process) 、 Nanotechnology
摘要: Methods for fabricating nanoscale features are disclosed. One technique involves depositing onto a substrate, where the first layer may be silicon and subsequently etched. A second third deposited on etch layer, followed by deposition of cap. The etched, exposing edges layers. cap removed either or creating pattern.
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