Self-aligned process for fabricating imprint templates containing variously etched features

摘要: A process that enables coplanarization of the structures have been created in multiple independent etch steps. The various etches are performed independently by selectively exposing only certain patterns to particular etching conditions. After these created, it is possible will exist at different planes/elevations relative template surface. elevations may be adjusted “higher” an anisotropic reduces overall elevation structures, while preserving structural topography.