Leakage current of multiferroic (Bi0.6Tb0.3La0.1)FeO3 thin films grown at various oxygen pressures by pulsed laser deposition and annealing effect
作者： Can Wang , Mitsue Takahashi , Hidetoshi Fujino , Xia Zhao , Eiji Kume
DOI: 10.1063/1.2177430
关键词: Pulsed laser deposition 、 Crystallinity 、 Analytical chemistry 、 Composite material 、 Carbon film 、 Annealing (metallurgy) 、 Oxygen 、 Thin film 、 Poole–Frenkel effect 、 Materials science 、 Electrical resistivity and conductivity
摘要: Thin films of multiferroic (Bi0.6Tb0.3La0.1)FeO3 were grown on Pt∕Ti∕SiO2∕Si substrate under various oxygen pressures by pulsed laser deposition technique. X-ray diffraction patterns show that the crystallinity thin film is improved with decreasing depositing pressure and at a lower 0.01torr exhibits single perovskite phase preferred (001) orientation. Leakage current as-deposited decreases pressure. Significantly, leakage can be reduced largely an annealing process 800°C flowing oxygen. The annealed relatively high resistivity stable polarization loops double remnant about 3μC∕cm2. conduction properties have been well analyzed, it indicated dominant mechanism space-charge-limited for higher Poole-Frenkel ...
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