Effects of Al incorporation on the mechanical and tribological properties of Ti-doped a-C:H films deposited by magnetron sputtering
作者： Xianjuan Pang , Lei Shi , Peng Wang , Yanqiu Xia , Weimin Liu
DOI: 10.1016/J.CAP.2010.11.060
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摘要: Abstract Ti-and TiAl-doped a-C:H films were deposited on silicon substrates by magnetron sputtering Ti and TiAl target in argon methane gas mixture atmosphere. To better elucidate the structural evolution after Al adding, X-ray diffraction, Raman spectroscopy, photoelectron spectroscopy used to comparatively analyze transformation as-deposited films. Compared with Ti-doped films, introduction of enhanced carbon graphitization effectively lowered residual stress from 1.35 GPa 0.65 GPa. Furthermore, though hardness was moderately lowered, exhibited higher toughness, lower friction coefficient wear rate. The tribological performances may originate formation graphitized transfer layer during test.
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