作者: AP Hitchcock , T Tyliszczak , P Brodersen , ZH Lu , MWC Dharma-Wardana
DOI: 10.1142/S0218625X99001232
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摘要: Monolayers of S and Cl have useful passivation properties for group IV III–V semiconductor surfaces. The structures Ge(111)–Cl; GaAs(111)–Cl; GaAs(111)A–S, GaAs(111)B–S GaAs(001)–S monolayer-passivated single crystal surfaces been studied using synchrotron radiation X-ray absorption fine structure spectroscopy (XAFS). near edge extended signals are interpreted comparisons to multiple scattering XAFS calculations and, in the cases Ge(111)–Cl GaAs(111)–Cl, comparison first-principles calculations. Relationships between surface development improved passivated discussed.