Molecular dynamics simulation of gold cluster growth during sputter deposition

摘要: We present a molecular dynamics simulation scheme that we apply to study the time evolution of self-organized growth process metalcluster assemblies formed by sputter-deposited gold atoms on planar surface. The model incorporates characteristics plasma-assisted deposition and allows for an investigation over wide range parameters. It is used obtain data cluster properties which can directly be compared with recently published experimental polystyrene [M. Schwartzkopf et al., ACS Appl. Mater. Interfaces 7, 13547 (2015)]. While good agreement found between two, simulations additionally provide valuable time-dependent real-space surface morphology, some whose details are hidden in reciprocal-space scattering images were analysis.