Selective ultrathin gold deposition by organometallic chemical vapor deposition onto organic self-assembled monolayers (SAMs)

摘要: We demonstrate a selective deposition of ultrathin gold layers via OMCVD (organometallic chemical vapor deposition) onto self-assembled dithiols. Dithiols have been to produce thiolated surface. The layer deposited from precursor, present in the around sample, is bound exposed thiol groups. that it possible deposit only areas where binding groups are located, and investigate growth process with spontaneous desorption time-of-flight mass spectrometry, Rutherford backscattering spectroscopy, atomic absorption spectroscopy force microscopy.