Method of shielding through silicon vias in a passive interposer

作者: Meng-Lin Chung , Chih-Hsien Lin , Hsiang-Tai Lu

DOI:

关键词:

摘要: A method of shielding through silicon vias (TSVs) in a passive interposer includes doping substrate with positive ions, and implanting ions an upper portion the substrate, such that has at least p-doped heavily portion. The further forming interlayer dielectric (ILD) above plurality ILD is configured to electrically couple one structure below interposer. forming, between pairs TSVs TSVs, lines dielectric, interconnect ILD.

参考文章(19)
John P. Erdeljac, Jeffrey P. Smith, Louis N. Hutter, Transistor with increased operating voltage and method of fabrication ,(1998)
Tim Niggemeier, Harry Barowski, Thomas Brunschwiler, Hubert Harrer, Andreas Huber, Stephan Paredes, Jochen Supper, Bruno Michel, Optimized semiconductor packaging in a three-dimensional stack ,(2011)
Kazutoshi Int. Prop. Div. Nakamura, Yusuke Int. Prop. Div. Kawaguchi, Norio Int. Prop. Div. Yasuhara, Akio Int. Prop. Div. Nakagawa, MOS field effect transistor with reduced on-resistance ,(2001)
Han Seong Jung, Tae Ho Song, Eun Sang Na, Chan Kong Kim, Sung Bum Sohn, Kang Heon Hur, Glass composition for low temperature sintering, glass frit, dielectric composition and multilayer ceramic capacitor using the same ,(2009)
Chien-Li Kuo, Chia-Fang Lin, Tsv structure and method for forming the same ,(2011)
Michael Patrick Chudzik, Anna Wanda Topol, Bruce Kenneth Furman, Chandrasekhar Narayan, Rajarao Jammy, Robert H. Dennard, Joseph F. Shepard, Sampath Purushothaman, Rama Divakaruni, High density chip carrier with integrated passive devices ,(2002)
Chen-Shien Chen, Ming-Fa Chen, Through Silicon Via Layout ,(2012)