作者: Oliver J.L. Fox , James O.P. Holloway , Gareth M. Fuge , Paul W. May , Mike N.R. Ashfold
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摘要: Nucleation is the rate-determining step in initial stages of most chemical vapour deposition processes. In order to achieve uniform diamond thin films it necessary seed non-diamond substrates. Here we discuss a simple electrospray technique for application 5 nm particles onto substrates various sizes. The influence selected parameters, such as experimental spatial arrangement and colloidal properties, are analysed optimizing method by optical electron microscopy, both before after nanocrystalline on layer. advantages limitations highlighted relation other commonly exploited nucleation techniques.