Photoresist compositions containing t-substituted organomethyl vinylaryl ether materials
作者： James V. Crivello
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摘要: t-Butylvinylaryl ethers are provided which can be used to make t-butyl substituted polyaryl and photoresist compositions. The compositions made by combining the t-butylpolyaryl with aromatic onium salts.
lens.org 参考文章(1)
Jean M. J. Frechet, Hiroshi Ito, Carlton G. Willson, Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone ,(1982)