Evaluating a geometric or material property of a multilayered structure

摘要: A structure having a number of traces passing through region is evaluated by using beam electromagnetic radiation to illuminate the region, and generating an electrical signal that indicates attribute portion (also called “reflected portion”) reflected from region. The just-described acts “illuminating” “generating” are repeated in another followed comparison generated signals identify variation property between two regions. Such measurements can variations material properties (or dimensions) different regions single semiconductor wafer type used fabrication integrated circuit dice, or even multiple such wafers. In one embodiment, each substantially parallel adjacent other, has wavelength greater than equal pitch at least traces. implementation polarized, be several ways, including, e.g., orienting so polarized direction to, perpendicular 45° Energy traces, whereas energy passes underneath Measurements light provide indication changes during process.