Deuterium depth profiles in metals using imaging field desorption

摘要: Depth profiles of 80‐eV deuterium ions implanted in situ into (110) tungsten have been measured by imaging, field‐desorption mass spectrometry. The relative abundance was from the surface to a depth 300 A with 2‐A resolution controlled field evaporation specimen, and time‐of‐flight spectroscopy. position depth‐distribution maximum (49±2 surface), structure distribution is consistent model which describes channeling near‐surface region following recoil implantation impurity species surface. these has also measured. For carbon oxygen, penetration limited 22 A, decreasing exponentially depths are agreement those predicted theoretically, assuming where oxygen channeled near‐su...