Selective molecular assembly patterning at the nanoscale: a novel platform for producing protein patterns by electron-beam lithography on Sio2/indium tin oxide coated glass substrates
作者： Jost W Lussi , Clarence Tang , Pierre-Andre Kuenzi , Urs Staufer , Gabor Csucs
DOI: 10.1088/0957-4484/16/9/062
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摘要: The creation of geometrically well-defined submicron structures on insulating substrates by e-beam lithography is hampered surface charging. This problem becomes crucial when trying to create nanosized protein patterns selective molecular assembly patterning (SMAP) transparent glass substrates. In this paper we demonstrate that the use thin films conductive indium tin oxide resolves issue charging during writing while being compatible with standard SMAP protocol for modification.
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