Lithographic apparatus, substrate table, and method for enhancing substrate release properties
作者： Arno Jan Bleeker , Rene Theodorus Petrus Compen , Michiel Puyt , Johannes Hendrikus Gertrudis Franssen , Johannes Theodorus Guillielmus Maria Van De Ven
DOI:
关键词:
摘要: A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, support patterning device. The device is capable of imparting the beam with pattern in its cross-section form patterned beam. also substrate table hold substrate, projection project onto target portion substrate. chuck having plurality protrusions corresponding parts bottom surface wafer. top at least one elements that define reduced contact area between protrusion.
lens.org参考文章(21)
Larry J. Hornbeck, Method of producing micromechanical devices ,(1993)
Grant Kenji Larsen, Surface structure and method of making, and electrostatic wafer clamp incorporating surface structure ,(2000)
Satoshi Yawata, Mitsuaki Morimoto, Makoto Nakahara, Takao Murayama, Akira Hirai, Naoto Yokoyama, Method for holding substrate in vacuum, method for manufacturing liquid crystal display device, and device for holding substrate ,(2003)
Babak Heidari, Torbjörn Ling, Stamp having an antisticking layer and a method of forming of repairing such a stamp ,(2002)
Brian J. Gally, Lauren Palmateer, Clarence Chui, William J. Cummings, Philip D. Floyd, Method and system for packaging a display ,(2005)
Michael G. Chafin, Hyman Levinstein, Vijay Parkhe, Dennis S. Grimard, Fusen Chen, Hybrid Johnsen-Rahbek electrostatic chuck having highly resistive mesas separating the chuck from a wafer supported thereupon and method of fabricating same ,(1997)
Aaron Partridge, Markus Lutz, Anti-stiction technique for thin film and wafer-bonded encapsulated microelectromechanical systems ,(2005)
Yukio Takabayashi, Substrate holding system and exposure apparatus using the same ,(1997)
Claudia Ekstein, Hubert Holderer, Yim-Bun Patrick Kwan, Johannes Deyhle, Support structure for temporarily supporting a substrate ,(2007)
Shigeyuki Uzawa, Yukio Takabayashi, Substrate holding apparatus, substrate transfer system, exposure apparatus, coating apparatus, method for making a device, and method for cleaning a substrate holding section ,(2000)